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Tantalum Sputtering Coating Machine

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Tantalum Sputtering Coating Machine

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Brand Name : ROYAL

Model Number : RTSP

Certification : CE

Place of Origin : China

MOQ : 1 set

Supply Ability : 10 sets per month

Delivery Time : 14~16weeks

Packaging Details : Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.

Technology : Arc ion plating + PVD sputtering deposition

Targets : TiAl, Ta, Ni, Cr, Ti, Au, Ag, SS, Cu, Zr, Al etc.

Properties : High Yield, High uniformity, high target utilization

Application : Multiple layer films deposition

Advantages : Environmentally friendly operating process

Factory Location : Shanghai city, China

Worldwide Service : Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America

Training Service : Machine operation, maintenance, coating process Recipes, program

Warranty : Limited warranty 1 year for free, whole life for machine

OEM & ODM : available, we support tailor made design and fabrication

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Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating

Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to erosion.

Sputtered tantalum films are widely used in the
1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

2. Medical instruments like body implants for its highly biocompatability property;

3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;

Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defectected and is adherent to the substrate is intended to protect.

RTAS1000 Technical Advantages

1. Plug-in Integrated design system for quick installation

2. Siemens PLC,CPU; with Industrial PC operation & control hardware

3. Available for remote monitoring and diagnosis.
4. Flexible, ready for upgrading

5. Multiple cathodes for fast deposition speed

Tantalum Sputtering Coating Machine

More benefits from the machine:

Robust Design, Stable Quality, Fast Cycle, Fast Cycle Time, High deposition speed

Main Configurations
MODEL RTAS1000
TECHNOLOGY DC magnetron sputtering + Cathodic arc plating
CHAMBER MATERIAL Stainless Steel (S304)
CHAMBER SIZE Φ1000*1000mm (H)
CHAMBER TYPE D shape, cylindrical chamber
ROTATION RACK & JIG SYSTEM Satellite driving or central driving system
POWER SUPPLIES DC Sputtering Power Supply: 2~4 sets Bias Power supply: 1 set Arc Power supply: 11 sets
DEPOSITION MATERIAL Ti/Cr/TiAl, Ta, Au, Ag, Cu etc.
DEPOSITION SOURCE

Planar Sputtering Cathodes + circular arc cathodes

Remark: cylinderial DC sputter is avaliable

CONTROL PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
PUMP SYSTEM Rotary Vane Pump: SV300B - 1 set (Leybold)
Roots Pump: WAU1001 - 1 set (Leybold)
Holding Pump: D60C - 1 set (Leybold)
Magnetic Suspension Molecular Pump: MAG2200 - 2 sest (Leybold)
GAS MASS FLOW CONTROLLER 4 channels, Made in China, Seven Star (CS series, ) digital model (Ar, N2, O2, C2H2)
VACUUM GAUGE Model: ZDF-X-LE, Made in China
SAFETY SYSTEM Numerous safety interlocks to protect operators and equipmen
HEATING Heaters: 20KW. Max. temp.: 450℃
COOLING Industrial Chiller (Cold Water)
POWER MAX. 100KW (Approx.)
AVERAGE POWER CONSUMPTION 45 KW (Approx.)
GROSS WEIGHT T (Approx.)
FOOT PRINT ( L*W*H) 4000*4000 *3600 MM
POWER ELECTRICAL AC 380V/3 phases/50HZ / 5 line

Cylindrical sputtering cathodes Planar sputtering cathodes

Tantalum Sputtering Coating Machine Tantalum Sputtering Coating Machine

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

Download the brochure, please click here: Magnetron Sputtering Deposition System.pdf
Magnetron Sputtering Deposition system applicatio...


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