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Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System

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Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System

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Brand Name : ROYAL

Model Number : RTSP-400

Certification : CE certification

Place of Origin : MADE IN CHINA

MOQ : 1 set

Price : negotiable

Payment Terms : L/C, T/T

Supply Ability : 10 sets per month

Delivery Time : 8 weeks

Packaging Details : Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.

Chamber : Horizontal Orientation

Sputtering Sources : MF, DC and RF

Sputtering Cathode : Circular Planar type

Sputtering Target : Al2O3, TiO, ITO, Cr, Zr, Au gold

Factory Location : Shanghai city, China

Worldwide Service : Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America

Training Service : Machine operation, maintenance, coating process Recipes, program

Warranty : Limited warranty 1 year for free, whole life for machine

OEM & ODM : available, we support tailor made design and fabrication

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Laboratory Magnetron Sputtering Vacuum Coating System

1. The UHV sputtering system is equipped with

  • DC sputtering guns to deposit the semi-conductive and non-conductive materials ( Si, SiO2, Al2O3, Si3N4 ,Cr2O3,ITO and other materials).
  • RF sputtering gun to deposit the conductive material Aluminum, Silver, Gold etc.
  • DC and RF power supply sources can be exchanged flexible.

2. The UHV sputtering system applications of

  • Conductive coatings on polymeric materials, wood, fabrics at low temperatures less than 100 ℃

Application of conductive coatings on glass, ceramics and other dielectric materials.

Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System

3. Technical Performance:

3. 1 Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.

3. 2. Operating Vacuum Pressure: 1.0×10-4 Torr.

3. 3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)

3. 4. Metalizing material (sputtering ) Al, Cr, Sn, Ti, SS, Cu… etc.

3. 5. Operating Model: Full Automatically /Semi-Auto/ Manually

4.​ Structure

The UHV Sputtering vacuum coating machine contains key completed system listed below:

1. Vacuum Chamber

2. Rouhging Vacuum Pumping System (Backing Pump Package)

3. High Vacuum Pumping System (Diffusion Pump)

4. Electrical Control and Operation System

5. Auxiliarry Facility System (Sub System)

6. Deposition System

For more specifications, please contact us. Customized inquiries are welcomed.


Product Tags:

magnetron sputtering equipment

      

vacuum deposition equipment

      
Cheap Laboratory DC and RF Sputtering Coating Machine, DC/MF Sputtering Lab.Coating Unit, R&D Lab. Sputtering System for sale

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