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Portable PVD Coating Machine , Magnetron Sputtering Unit for Labrotary R&D, DC/FM/RF Sputtering Lab. Coater

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Portable PVD Coating Machine , Magnetron Sputtering Unit for Labrotary R&D, DC/FM/RF Sputtering Lab. Coater

Brand Name : ROYAL

Model Number : RTSP400

Certification : CE

Place of Origin : Made in China

MOQ : 1 set

Price : negotiable

Payment Terms : L/C, T/T, D/A, D/P

Supply Ability : 10 sets per month

Delivery Time : 8 weeks

Packaging Details : Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.

Application : R&D, labrotary

Evaporation Source : Sputtering cathode, sputter gun, DC. RF. MF models

Deposition Materials : Si,Ti, Aluminum, gold, silver, chromium, copper, Indium, Indium Tin Oxide, Nickel

Coatings : Optical Coatings, hard coatings, ITO, DLC etc.

Applications : Semiconductor, Solar Cell, Fuel cell, Scientific organizations, universities, aerospace researching system, high energy physics department etc.

Factory Location : Shanghai city, China

Worldwide Service : Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America

Training Service : Machine operation, maintenance, coating process Recipes, program

Warranty : Limited warranty 1 year for free, whole life for machine

OEM & ODM : available, we support tailor made design and fabrication

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Laboratory Thin Film Magnetron Sputtering Coating Machine / Portable Thin Film Sputtering Coating System

Royal Technology has designed and provided various of Ultra-High-Vacuum coating systems for college teaching and scientific research and development, to study various different film growth, generates more innovative NANO thin films are applied with our commercial industries. Our customers like: Shanghai University of China, Machanster University of UK, Beijing Scientific University, Semiconductor, Solar Cell, Fuel cell, Scientific organizations aerospace researching and high energy physics department etc.

Laboratory Thin Film Magnetron Sputtering Coating Machine : DC, MF, RF sputtering cathodes for R&D purpose can get monolayer, dielectric film, compound film, semiconductor, multiple layers, composite film, and dielectric films etc

Laboratory Thin Film Magnetron Sputtering Coating Machine Technical Performance:

1 Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.

2. Operating Vacuum Pressure: 1.0×10-4 Torr.

3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)

4. Metalizing material (sputtering ) Al, Cr, Sn, Ti, SS, Cu… etc.

5. Operating Model: Full Automatically /Semi-Auto/ Manually

Laboratory Thin Film Magnetron Sputtering Coating Machine Structure

1. Vacuum Chamber

2. Rouhging Vacuum Pumping System (Backing Pump Package)

3. High Vacuum Pumping System (Diffusion Pump)

4. Electrical Control and Operation System

5. Auxiliarry Facility System (Sub System)

6. Deposition System

Portable PVD Coating Machine , Magnetron Sputtering Unit for Labrotary R&D, DC/FM/RF Sputtering Lab. Coater

The Laboratory Thin Film Magnetron Sputtering Coating System also can combine with arc cathod and evaporation sources for more studies application. Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.


Product Tags:

thin film coating equipment

      

thin film deposition equipment

      
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